7-1/2" HARD FOAM POLISHING DISC - T-01220
MAKT01220
Prix régulier
$31.14
Preorder today
- High-quality foam pads ideal for professional applications
- The partially closed cells are strategically structured to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower polish absorption rate improves polishing performance
- The reduced surface tension allows the operator to move the pad flat across the working surface with a significantly reduced pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, improving operator control.
- Reduced contact surface generates less friction and heat
- The curved edges allow for easier polishing in corners and along edges
- Hook and loop support
- High-quality foam pads ideal for professional applications
- The partially closed cells are strategically structured to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower polish absorption rate improves polishing performance
- The reduced surface tension allows the operator to move the pad flat across the working surface with a significantly reduced pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, improving operator control.
- Reduced contact surface generates less friction and heat
- The curved edges allow for easier polishing in corners and along edges
- Hook and loop support
MAKT01220
Prix régulier
$31.14
Preorder today
- High-quality foam pads ideal for professional applications
- The partially closed cells are strategically structured to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower polish absorption rate improves polishing performance
- The reduced surface tension allows the operator to move the pad flat across the working surface with a significantly reduced pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, improving operator control.
- Reduced contact surface generates less friction and heat
- The curved edges allow for easier polishing in corners and along edges
- Hook and loop support
- High-quality foam pads ideal for professional applications
- The partially closed cells are strategically structured to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower polish absorption rate improves polishing performance
- The reduced surface tension allows the operator to move the pad flat across the working surface with a significantly reduced pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, improving operator control.
- Reduced contact surface generates less friction and heat
- The curved edges allow for easier polishing in corners and along edges
- Hook and loop support