7-1/2" MEDIUM FOAM POLISHING DISC - T-01236
MAKT01236
Prix régulier
$30.11
Preorder today
- Installation and removal without damaging the thread
- The partially closed cells are strategically shaped to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower absorption rate of polish improves polishing performance
- The reduced surface tension allows the operator to operate the pad flat on the working surface with a significantly minimized pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, resulting in increased operator control.
- Reducing surface contact generates less friction and heat
- The curved edges make polishing easier in corners and along edges
- Crochet and loop saving
- Installation and removal without damaging the thread
- The partially closed cells are strategically shaped to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower absorption rate of polish improves polishing performance
- The reduced surface tension allows the operator to operate the pad flat on the working surface with a significantly minimized pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, resulting in increased operator control.
- Reducing surface contact generates less friction and heat
- The curved edges make polishing easier in corners and along edges
- Crochet and loop saving
MAKT01236
Prix régulier
$30.11
Preorder today
- Installation and removal without damaging the thread
- The partially closed cells are strategically shaped to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower absorption rate of polish improves polishing performance
- The reduced surface tension allows the operator to operate the pad flat on the working surface with a significantly minimized pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, resulting in increased operator control.
- Reducing surface contact generates less friction and heat
- The curved edges make polishing easier in corners and along edges
- Crochet and loop saving
- Installation and removal without damaging the thread
- The partially closed cells are strategically shaped to significantly improve polishing performance by evenly dispersing the compound/polishing agent over the working surface.
- A slower absorption rate of polish improves polishing performance
- The reduced surface tension allows the operator to operate the pad flat on the working surface with a significantly minimized pad jump.
- The CCS pockets gradually release the compound/polishing agent as needed, resulting in increased operator control.
- Reducing surface contact generates less friction and heat
- The curved edges make polishing easier in corners and along edges
- Crochet and loop saving